JPH055370B2 - - Google Patents

Info

Publication number
JPH055370B2
JPH055370B2 JP61159648A JP15964886A JPH055370B2 JP H055370 B2 JPH055370 B2 JP H055370B2 JP 61159648 A JP61159648 A JP 61159648A JP 15964886 A JP15964886 A JP 15964886A JP H055370 B2 JPH055370 B2 JP H055370B2
Authority
JP
Japan
Prior art keywords
sample
plasma
discharge chamber
mounting surface
periphery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61159648A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6316624A (ja
Inventor
Katsuyoshi Kudo
Yoshinao Kawasaki
Minoru Soraoka
Tsunehiko Tsubone
Hironori Kawahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15964886A priority Critical patent/JPS6316624A/ja
Publication of JPS6316624A publication Critical patent/JPS6316624A/ja
Publication of JPH055370B2 publication Critical patent/JPH055370B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15964886A 1986-07-09 1986-07-09 プラズマ処理装置 Granted JPS6316624A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15964886A JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15964886A JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS6316624A JPS6316624A (ja) 1988-01-23
JPH055370B2 true JPH055370B2 (en]) 1993-01-22

Family

ID=15698301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15964886A Granted JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS6316624A (en])

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599726A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Method and device for plasma treatment

Also Published As

Publication number Publication date
JPS6316624A (ja) 1988-01-23

Similar Documents

Publication Publication Date Title
JP3233575B2 (ja) プラズマ処理装置
JP3217274B2 (ja) 表面波プラズマ処理装置
JP3190536B2 (ja) マイクロ波トラップを有するプラズマアッシャー
JPH0216731A (ja) プラズマ反応装置
JP7001456B2 (ja) プラズマ処理装置
JPH0319332A (ja) マイクロ波プラズマ処理装置
JPH01184923A (ja) プラズマ処理装置及びプラズマ処理方法
JPH06232081A (ja) Icpプラズマ処理装置
JP3294839B2 (ja) プラズマ処理方法
JPH055370B2 (en])
JPS62210621A (ja) マイクロ波プラズマ処理方法および装置
JP2913131B2 (ja) マイクロ波プラズマ装置
JPH10294199A (ja) マイクロ波プラズマ処理装置
JPH01187824A (ja) プラズマ処理装置
JPH05182785A (ja) マイクロ波放電反応装置及び電極装置
JP3805808B2 (ja) 高周波放電処理装置
JP3205542B2 (ja) プラズマ装置
JP2515885B2 (ja) プラズマ処理装置
JP3396345B2 (ja) プラズマ発生装置
JP2000012294A (ja) プラズマ処理装置
JP2001044175A (ja) プラズマ処理装置
JPH04264722A (ja) プラズマ処理方法及びその装置
JPH10261496A (ja) マイクロ波プラズマ処理方法および装置
KR0140089Y1 (ko) 마이크로파 전달장치
JPH06181179A (ja) プラズマ処理装置